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新一代二维通道电子倍增器的薄膜连续打拿极 被引量:2

A Film Continuous Dynode of the New Generation Two-Dimension Channel Electron-multiplier
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摘要 概述了传统还原铅硅酸盐玻璃微通道板(RLSG-MCP)及其特点以及MCP的新发展;介绍了材料的二次发射特性,给出了传统MCP薄膜连续打拿极结构特点和形成工艺。在此基础上,重点论述了用半导体工艺技术制作新一代二维电子倍增器———先进技术微通道板(AT-MCP)的薄膜连续打拿极制备新技术,给出了具体工艺和实验结果,示出了电镜照片和实验曲线,指出了新工艺的优点和发展前景。 Microchannel plate (MCP) is a kind of vacuum electron-multiplier with beehive structure, which is invented in the late sixties of the last century. It is a two-dimension array, consisting of single channel electron-multiplier. As MCP has the characteristics of high gain, low noise, high resolution, low power, long life and the self-saturation effect, it is applied in charge particles, short-wave optical quantum and other detection devices and systems. A method of traditional Reduced Lead Silicate-Glass Microchannel Plate (RLSG-MCP), its characteristics and the recent development are summarized briefly. The characteristics of secondary electron emitting of the materials are introduced, the structure characteristic and form technology of film continuous dynode of traditional MCP are given out. The method, that the new generation of film continuous dynode of twodimension electron-multiplier fabricated by semiconductor technology-Advanced Technology Microchannel Plate (AT-MCP) facture technology, is demonstrated emphatically. The detailed technology and experimental results are presented. Adopting UV-optoelectronic method, the MCP sample having a diameter of 25 mm is measured. When the working voltage is 400 V and the input current is 3 × 10^-11 A, the electron gain is 110. The coefficient of secondary electron emitting is calculated to be 1.8 accordingly. The electron microscope picture and the experimental curves are also shown. Finally, the advantage and development foreground of the new techno-logy are pointed out. The materials of continuous dynode of the new technology are flexible and not restricted to the materials of basic body. The fabrication technology of the dynode is independent of the formation technology of the basic body. As the film continuous dynode of AT-MCP fabricated by semiconductor technology is concerned, the LPCVD and thermal oxidation technology is the optimal choice at present. The principle is right and the technology is feasible. Especially, the conductibility of continuous dynode fabricated by the new technology can be satisfied for the requirement easily, but the traditional technology can not exceed.
出处 《发光学报》 EI CAS CSCD 北大核心 2006年第3期421-425,共5页 Chinese Journal of Luminescence
关键词 微通道板 连续打拿极 低压化学气相沉积 二次电子发射 micro-channel-plate continuous dynode low-pressure chemical vapor deposition secondary electron emitting
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