摘要
介绍了微光学自适应技术中基于PZT(PbZrxT i1-xO3)薄膜的微反射镜单元及其制作工艺。该制作过程中用重掺杂硅片作为基底和下电极,采用了钛酸丁脂[(C4H9O)4T i]、乙酸铅[Pb(CH3COO2).3H2O]以及异丙醇锆[Zr(OCH(CH3)2 4.(CH3)2CHOH]为原料,通过溶胶-凝胶法(so l-gel)制作薄膜,薄膜厚度为纳米级。制成的PZT薄膜通过逆压电效应产生形变,对反射镜面局部进行微调,实现波前位相控制。
A novel method of micro-mirror unit based on PZT thin film in adaptive optics and its technical process are introduced. In this process, heavily doped silicon （Si） is used as substrate and bottom electrode. The PZT film whose thickness is of several nanometers is fabricated by sol-gel method using the following chemical materials ： （C4H9O）4Ti, Pb （CH3COO）2·3H2O and Zr （OCH （CH3）2）4·（CH3）2CHOH. According to converse piezoelectric effect, the thickness of the fabricated PZT thin film varies when the applied voltage changes, making adjustment in the small to the micro-mirror surface. As a result, the wave-front adjustment by phase control is realized.
出处
《光学仪器》
2006年第3期81-85,共5页
Optical Instruments
