摘要
本文详细介绍了长真空管道内表面直流溅射镀TiN膜技术和成膜系统配置。采用真空管道自体真空镀膜方法解决细长管道内表面镀膜问题,特殊的阴极靶结构设计成功地解决了长管道内表面直流溅射镀膜的问题。本实验方法在真空管道内壁获得了均匀的、高品质的TiN膜层,并实现了细长真空管道大面积镀膜过程的稳定性、重复性和一致性。真空管道自体直流溅射镀膜实验中采用的工作原理以及设备简单,操作方便,成本低廉。
A novel technique-self-sputtering-has been successfuUy developed to coat TiN films on inside walls of long narrow vacuum pipes. Discussion focuses on design of geometry of the cathode target in TiN film growth by DC magnetron sputtering. The TiN films, coated on the inside walls of long narrow pipes in different diameters, were found to be fairly uniform, highly stable with strong interfacial adhesion. Many strengths of the new technique were also discussed.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2006年第3期232-235,共4页
Chinese Journal of Vacuum Science and Technology
基金
国家自然科学基金(No.10245002)
关键词
TIN膜
直流溅射
管道镀膜
阴极靶
辉光放电
TiN coating, DC sputtering, Tube plating, Cathode target, Glow discharge
