期刊文献+

PI/α-Al_2O_3和PI/SiO_2表面结合能的分子模拟 被引量:5

Molecular Simulation of Binding Energy of PI/α-Al_2O_3 and PI/SiO_2 Surface
下载PDF
导出
摘要 利用M ateria ls S tud io 3.0分别模拟了聚酰亚胺(P I)/-αA l2O3和聚酰亚胺(P I)/S iO2材料体系的表面结合能,结果表明,在(012)晶面,6.0 nm×4.0 nm范围内,随着纳米颗粒超晶格尺寸增大,P I/-αA l2O3结合能增加,P I/S iO2体系结合能变小;悬挂在-αA l2O3和S iO2(012)晶面上的H原子对体系总能量及结合能有明显影响,-αA l2O3和S iO2纳米颗粒掺杂主要通过分子间作用力与P I相复合。 The PI/hybrid inorganic nanoparticle materials have excellent mechanics, electricily, optics and thermodynamic performance, and it has attracted much attention in the field of materials science research. In this paper, the surface binding energy of PI/α-Al2O3 and PI/SiO2 composite systems were simulated respectively by Materials Studio 3.0. The results of simulation show that with an increase of nanoparticle superlattice size, the binding energy of PI/α-Al2O3 increases and that of PI/SiO2 decreases in the range of 6.0 nm × 4.0 nm area on crystal surface (012). The H atoms hanging on the crystal surface (012) of α-Al2O3 and SiO2 have a great effect upon the total energy and binding energy of the system, and the conclusion is that the doping nanoparticle α-Al2O3 and SiO2 mainly combine with PI through intermolecular force.
出处 《高分子材料科学与工程》 EI CAS CSCD 北大核心 2006年第5期41-44,共4页 Polymer Materials Science & Engineering
基金 国家自然科学基金重点项目(50137010)
关键词 分子模拟 结合能 聚酰亚胺 Α-氧化铝 氧化硅 molecular simulation binding energy α-Al2O3 SiO2
  • 相关文献

参考文献11

  • 1hofmann D,Fritz L,Ulbrich J.Polymer,1997,25:6145~6155.
  • 2朱申敏(ZHUShen-min) 孙辉(SUNHui) 程时远(CHENGShi-yuan) 等.高分子材料科学与工程,2001,17(4):31-34.
  • 3Charati S G,Sern S A.Macromolecules,1998,31:5529~5538.
  • 4Hofmann D,Fritz L,Ulbrich J.Computational and Theoretical Polymer Science,2000,10:419~436.
  • 5Heuchel M,Hofmann D.Desalination,2002,144:67~72.
  • 6Li Y,Wang X,Ding M,et al.J.Appl.Polym.Sci.,1996,61:741~748.
  • 7Ramos M M D.Vacuum,2002,64:255~260.
  • 8Wesner D A,Weichenhain R,Prleging W.Fresenius.J.Anal.Chem.,1997,358:248~250.
  • 9Tong H Y,Shi F G,Zhao B.Appl.Phys.A,1997,65:287~290.
  • 10杨春,李言荣,陶佰万,刘兴钊,张鹰,刘永华.α-Al_2O_3基片(0001)表面及其对ZnO吸附位置研究[J].真空科学与技术学报,2004,24(1):5-10. 被引量:2

二级参考文献24

  • 1Harrison N M.Computer Physics Communications,2001,137:59
  • 2Ye F C,Bagnall D M,Hang J K.J Appl Phys,1998,84(7):3912
  • 3Ohnishi T,Ohtomo A,Ohkuboa I.Materials Science and Engineering,1998,B56:256
  • 4Millon E,Albert O,Loulergue J C.J Appl Phys,2000,88(11):6937
  • 5Maeda T,Yoshimoto M,Phnishi T.J cryst Growth,1997,17:95
  • 6Robert M.CRC Handbook of Chemistry and Physics Florida:CRC Press,1993
  • 7Baxter R,Reinhardt P,López N.Surf Sci,2001,445:448
  • 8Huang H,Gilmer G H.J Appl Phys,1998,84:3636
  • 9Imai Y,Mukaida M,Tsunodo T.Thin solid Films,2001,381:176
  • 10Vanderbilt D.Phys Rev,1990,B41:7892

共引文献1

同被引文献39

引证文献5

二级引证文献7

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部