摘要
用对向靶溅射仪制备出含多量Ｆｅ（１６）Ｎ２相的（Ｆｅ，Ｔｉ）－Ｎ薄膜，研究了掺杂Ｔｉ对Ｆｅ－Ｎ薄膜结构与磁性的影响，在溅射Ｆｅ－Ｎ薄膜时加入适量的Ｔｉ可提高Ｆｅ－Ｎ薄膜中Ｆｅ（１６）Ｎ２相的含量．Ｔｉ含量（原子分数）在０—２５％时薄膜饱和磁化强度均高于纯Ｆｅ的值；Ｔｉ浓度为１０％时，薄膜磁化强度高达２．６８Ｔ，比纯Ｆｅ的饱和磁化强度值高２０％．
Fe,Ti)-N films with high content of Fe16N2 phase are prepared by facing target sputtering. Influences of doped titanium content on the structure and magnetic properties of Fe-N films are investigated. According to XRD and TEM results, optimum Ti additions enhance the formation of the 16:2 nitride, the values of saturation magnetization Bs for (Fe,Ti)-N films with Ti atomic fraction of 0 25% are larger than that for pure bcc iron, the maximum value for Bs is 2.68 T for the sample with 10% Ti, this value is 20% larger than that for pure bcc iron.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
1996年第11期1199-1203,共5页
Acta Metallurgica Sinica
基金
国家自然科学基金
中关村联合测试基金
天津市21世纪青年科学基金
关键词
对向靶溅射
掺杂
磁性
薄膜
钛
facing target sputtering, Fe16N2 thin film, Ti doping, magnetic property,structure
