摘要
对现有的软刻蚀方法提出了改进,让其与压印技术及毛细力刻蚀技术相结合形成一种薄层软刻蚀技术,并以这种技术制备出PMMA薄膜微图案化结构.在30 mm/h的拉膜速度以及弹性印章表面图形深度确定不变的情况下,PMMA流体能够完全填充到弹性印章的微通道中,SEM和光学显微镜照片证明得到的PMMA微图案是相互分离的.因此,薄层软刻蚀技术可以克服普通微模塑方法制备分离图形困难和纳米压印技术中需要使用巨大机械压力的缺点.
A new lithography technology called thin layer soft lithography （TLSL） was proposed for the improvements of soft lithography. In this article, PMMA uniform thin layer was first deposited on glass substrate using dip-coating technology with 30 mm/h immersion and withdrawn velocity. When a micropatterned PDMS stamp is placed on the PMMA thin layer surface with 20 g contact load and heated above the PMMA glass-transition temperature （ Tg）, PMMA melt will fill into the cavity between the stamp and the PMMA thin layer within 60 rain time, thereby generating a negative replica of the stamp. SEM and optical micregraph images show that the PMMA micropatterns are separated from each other, which is very hard to obtain in normal micromolding or nanoimprint lithography. Hence this technology is the combination of the advantages of room temperature nanoimprint lithography with the capillary force lithography. It overcomes the use of extremely high pressure in room temperature nanoimprint lithography and the lack of the drive force in capillary force lithography.
出处
《高分子学报》
SCIE
CAS
CSCD
北大核心
2007年第1期42-46,共5页
Acta Polymerica Sinica
基金
国家自然科学基金(基金号20374049)资助项目
高等学校博士学科点专项科研基金(基金号20040358018)
华东交通大学基金(基金号304139)资助项目
关键词
薄层软刻蚀
聚甲基丙烯酸甲酯
微结构
Thin layer soft lithography, Polymethyl methacrylate （PMMA）, Micrepattern
