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Ferroelectric properties of dysprosium-doped Bi_4Ti_3O_(12) thin films crystallized in various atmospheres 被引量:1

Ferroelectric properties of dysprosium-doped Bi_4Ti_3O_(12) thin films crystallized in various atmospheres
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摘要 Dysprosium-doped Bi4Ti3O12 (Bi3.4Dy0.6Ti3O12, BDT) ferroelectric thin films were deposited on Pt(111)/Ti/SiO2/Si(111) substrates by chemical solution deposition (CSD) and crystallized in nitrogen, air and oxygen atmospheres, respectively. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to identify the crystal structure, the surface and cross-section morphology of the deposited ferroelectric films. The results show that the crystallization atmosphere has significant effect on determining the crystallization and ferroelectric properties of the BDT films. The film crystallized in nitrogen at a relatively low temperature of 650 ℃, exhibits excellent crystallinity and ferroelectricity with a remanent polarization of 2Pr = 24.9 μC/cm2 and a coercive field of 144.5 kV/cm. While the films annealed in air and oxygen at 650 ℃ do not show good crystallinity and ferroelectricity until they are annealed at 700 ℃. The structure evolution and ferroelectric properties of BDT thin films annealed under different temperatures (600?750 ℃) were also investigated. The crystallinity of the BDT films is improved and the average grain size increases when the annealing temperature increases from 600 ℃ to 750 ℃ at an interval of 50 ℃. However, the polarization of the films is not monotonous function of the annealing temperature. Dysprosium-doped Bi4Ti3O12 (Bi3.4Dy0.6Ti3O12, BDT) ferroelectric thin films were deposited on Pt(111)/Ti/SiO2/Si(111) substrates by chemical solution deposition (CSD) and crystallized in nitrogen, air and oxygen atmospheres, respectively. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to identify the crystal structure, the surface and cross-section morphology of the deposited ferroelectric films. The results show that the crystallization atmosphere has significant effect on determining the crystallization and ferroelectric properties of the BDT films. The film crystallized in nitrogen at a relatively low temperature of 650 ℃, exhibits excellent crystallinity and ferroelectricity with a remanent polarization of 2Pr = 24.9 ℃/cm^2 and a coercive field of 144.5 kV/cm. While the films annealed in air and oxygen at 650 ℃ do not show good crystallinity and ferroelectricity until they are annealed at 700 ℃. The structure evolution and ferroelectric properties of BDT thin films annealed under different temperatures (600-750 ℃) were also investigated. The crystallinity of the BDT films is improved and the average grain size increases when the annealing temperature increases from 600 ℃ to 750 ℃ at an interval of 50 ℃. However, the polarization of the films is not monotonous function of the annealing temperature.
出处 《中国有色金属学会会刊:英文版》 CSCD 2006年第B01期33-36,共4页 Transactions of Nonferrous Metals Society of China
基金 Project (05FJ2005) supported by the Key Project of Scientific and Technological Department of Hunan Province, China Project (05C095) supported by the Research Funds of Educational Department of Hunan Province, China
关键词 BDT薄膜 结晶气氛 铁电性质 镝掺杂 BI4TI3O12 BDT thin films CSD crystallization atmosphere
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