摘要
本文采用脉冲激光沉积法（PLD）制备了ITO导电薄膜，并对其形貌、光学性质和电学性质进行了研究。结果表明，使用PLD方法制备的ITO导电薄膜在可见光区的平均透光率约为80％，方块电阻在100—200Ω／□之间。当衬底温度控制在300℃，氧压控制在1．33Pa时，可以得到具有较高透光率和电导率的ITO导电薄膜。
ITO films were fabricated by pulsed laser deposition（ PLD） method. Structure and optoelectrical properties of the deposited films were investigated. The average optical transmittance was 80% in the visible light range. The sheet resistance was about 100 - 200Ω/□ ITO films which were deposited by PLD at 300℃ and 1.33Pa of oxygen exhibited high optical transparency and conductivity.
出处
《激光杂志》
CAS
CSCD
北大核心
2007年第1期81-82,共2页
Laser Journal
基金
山东省自然科学基金资助项目(Y2002A09)
