摘要
以金属钨为靶材,采用直流反应磁控溅射方法,在玻璃上制备电致变色WO3薄膜。利用X射线衍射(XRD)方法对薄膜的结构进行了分析,得出了WO3薄膜的沉积工艺。制备了WO3)ITO)Glass电致变色器件,并对其性能进行了研究。结果表明:在Li+注入前后,薄膜的透射率平均变化约50%,具有较好的可逆变色特性;Li+注入后,WO3薄膜中的一部分W6+转变为W5+,转化比例约为25%。
Using pure tungsten as target, WO3 thin films were prepared on glass substrate by DC reactive magnetron sputtering. Its crystal structures were analyzed by X-ray diffraction（XRD） method.The deposition technology of the WO3 thin film was obtained. Electrochromism device of WO3/ITO/Glass was prepared and its properties were studied. The experimental results showed that the transmissivity of the WO3 thin fdm changed about 50% after the Li ions in jection.The device has a preferably reversible electrochromism performance, about 25% of Wb in the WO3 thin film change to W^5＋.
出处
《真空与低温》
2007年第1期16-20,共5页
Vacuum and Cryogenics
关键词
直流磁控溅射
WO3
电致变色
薄膜
DC magnetron sputtering
WO3
electrochromic
thin films
