摘要
A novel approximation of the two-dimensional （2D） potential function perpendicular to the channel is proposed,and then an analytical threshold voltage model for a fully depleted SOI-MOSFET with a non-uniform Gaussian distribution doping profile is given based on this approximation. The model agrees well with numerical simulation by MEDICI. The result represents a new way and some reference points in analyzing and controlling the threshold voltage of non-uniform fully depleted （FD） SOI devices in practice.
对垂直于沟道的二维电势分布函数提出了一种新的近似,给出了基于这种近似的杂质浓度呈高斯分布的非均匀掺杂全耗尽SOI-MOSFET的阈值电压解析模型.模型结果与MEDICI数值模拟结果符合得很好,表明了模型的准确性,这为实践中分析与控制非均匀掺杂的全耗尽SOI-MOSFET的阈值电压提供了一种新的途径.
