摘要
通过射频磁控溅射在Si(100)基片上制备了ZnO薄膜,该文着重研究了磁控溅射中各生长参数如衬底温度、氧分压及后处理工艺等因素对氧化锌薄膜结晶性能、表面形貌、择优取向与微结构的影响,并对溅射工艺与取向、结构的关系进行了分析比较,从而确定了最佳溅射及后处理条件并获得了c轴择优取向的ZnO薄膜。
The zinc oxide （ZnO） thin films were deposited on Si （100） substrate by RF magnetron sputtering technique from a ZnO ceramic target. This paper discussed the relationship of microstructure, surface morphology and preferred orientation with the deposition parameters, such as substrate temperature, oxygen partial pressure, and final annealing treatment,etc. It was found that the preferred orientation and microstructure of ZnO films were strongly affected by the sputtering and annealing condition. The optimum conditions of RF sputtering were also studied in detail. Based on the conditions obtained, an excellent ZnO films with high c-axis orientation has been realized.
出处
《压电与声光》
CAS
CSCD
北大核心
2007年第3期318-320,323,共4页
Piezoelectrics & Acoustooptics
基金
国家重点基础研究专项"九七三"基金资助项目(No.5130Z02)
关键词
氧化锌薄膜
磁控溅射
氧分压
择优取向
ZnO thin film
RF magnetron sputtering
oxygen partial pressure
preferred orientation
