摘要
采用中频磁控溅射结合离子源技术沉积Cr/CrN/CrNC/CrC/Cr-DLC膜层。利用扫描电镜(SEM)、电子能谱(EDS)、Raman光谱和俄歇深层剥层分别对膜层微观形貌、成分组成、键结构及梯度成分深层分布进行分析;采用努氏显微硬度计、摩擦磨损试验机、划痕仪及洛氏硬度计测评膜层机械性能。结果表明:采用中频磁控溅射可沉积出大面积Cr/CrN/CrNC/CrC/Cr-DLC梯度膜层;Cr溅射功率对C键结构影响不大,但表层DLC中Cr的含量和膜层厚度随中频功率增大而增大;随DLC中掺Cr量增多,膜层硬度及摩擦因数略有上升;采用梯度过渡层及掺入金属Cr提高了膜层附着力,但过高的中频功率使沉积离子能量偏高,膜层压应力增加反而降低了膜层附着性能。
Gradient coatings of Cr/CrN/CrNC/CrC/Cr-DLC were deposited by Twin Middle Frequency Magnetron Sputtering （TMF-MS） method combined with ion source technique. Microstructure, composition, bond structure and gradient structure were characterized by SEM, EDS, Raman spectroscopy and Auger spectrometer respectively. Tribological properties were evaluated by Knoop Microhardness tester, friction and wear tester, scratching tester and Rockwell-C intender. The results showed that a large area gradient Cr/CrN/CrNC/CrC/Cr-DLC coating can be deposited by the hybrid technique. The C bond structure of the coatings is not obviously influenced by TMF-MS power. The concentration of Cr and thickness of the coatings is increased with the power of TMF-MS. The hardness of coatings is decreased with the increase of Cr in DLC, meanwhile the friction coefficient is slightly increased. The gradient interlayer and doped Cr can improve the adhesion of DLC films, however, the high MF power may lead to deterioration of adhesion due to high compression stress.
出处
《中国表面工程》
EI
CAS
CSCD
2007年第3期34-38,共5页
China Surface Engineering
基金
国家科技部项目
国科发财字[2005]300号
关键词
Cr-DLC
中频磁控溅射
离子源
附着力
Cr-DLC
graduated interlayer
middle frequency magnetron sputtering
ion beam
adhesion
