摘要
采用原子力显微镜(AFM)对γ-甲基丙烯酰氧丙基三甲氧基硅烷(KH-570)改性后的云母表面形貌进行观测,并综合表面粗糙度Rq、粒子高度D及Z方向最高高度等参数考察了清洗方式、偶联剂浓度以及清洗和烘干顺序对改性后云母表面形貌的影响。实验结果显示:改性后云母表面粗糙度受云母表面的点缺陷、清洗方式及处理顺序等因素影响,而偶联剂分子在云母表面的存在形态受改性溶液中偶联剂浓度的影响。随着偶联剂浓度的减小,改性后云母表面上偶联剂由网状变为分散点状。
The surface topography of mica modified by 3-（trimethoxysilyl）propyl methacrylate （KH-570） was studied by atomic force microscope （AFM）. Surface parameters such as roughness Rq, particle height D and the highest value at Z direction were measured. The influence of several factors on the surface topography of modified mica was investigated, including rinse, the concentration of KH-570 and the order of rinse and drying. The results indicated that the value of Rq was affected by the point defect on mica surface, rinse and the disposal after modification, while the morphology of KH-570 molecular aggregate was depended on the concentration of KH-570. As the concentration reduced, the morphology changed from cross-linked web to divergent points.
出处
《电子显微学报》
CAS
CSCD
2007年第3期199-203,共5页
Journal of Chinese Electron Microscopy Society
