摘要
硅纳米线作为一种新型的一维纳米材料,在纳米电子器件、光电器件及集成电路方面具有很好的应用前景。介绍了硅纳米线在制备方面的国内外研究现状与进展,重点讨论了基于金属催化气-液-固(VLS)生长机理、氧化物辅助生长机理的硅纳米线制备及模板法等制备硅纳米线的研究成果、特点及生长机理。与金属催化VLS生长机理相比,氧化物辅助生长硅纳米线不需要金属催化剂,能避免金属污染,保证了硅纳米线的纯度,因而是今后深入研究的方向。
Si nanowire is a new kind of one-dimensional nanoscale materials and is very promising in applications for nanoscale electronic devices, optoelectronic devices and integrate circuit. The current research situation and recent development of the preparation methods of Si nanowires are introduced. The research results and characteristics of the preparation methods of Si nanowires prepared according to metal vapor-liquid-solid ( VLS ) growth mechanism, oxide-assisted growth mechanism and template method et al. are discussed in detail in the paper. Compared to Si nanowires prepared by metal-catalytic VLS growth mechanism, Si nanowires prepared by oxide-assisted growth mechanism without metal catalysts have no metal pollution resulting in the increase of the purity of Si nanowires. Therefore, oxide-assisted growth mechanism for preparing Si nanowires is an important research direction in future.
出处
《稀有金属快报》
CSCD
2007年第6期11-17,共7页
Rare Metals Letters
关键词
硅纳米线
激光烧蚀法
热蒸发法
模板法
生长机理
silicon nanowires
laser ablation
thermal evaporation
template method
growth mechanism