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Photoresponse of the In0.3Ga0.7N metal-insulator-semiconductor photodetectors

Photoresponse of the In0.3Ga0.7N metal-insulator-semiconductor photodetectors
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摘要 In0.3Ga0.7N metal-insulator-semiconductor (MIS) and metal-semiconductor (MS) surface barrier photodetectors have been fabricated. The In0.3Ga0.7N epilayers were grown on sapphire by metalorganic chemical vapour deposition (MOCVD). The photoresponse and reverse current-voltage characteristics of the In0.3Ga0.7N MIS and MS photodetectors were measured. A best zero bias responsivity of 0.18 A/W at 450 nm is obtained for the In0.3Ga0.7N MIS photodetector with 10 nm Si3N4 insulator layer, which is more than ten times higher than the In0.3Ga0.7N MS photodetector. The reason is attributed to the decrease of the interface states and increase of surface barrier height by the inserted insulator. The influence of the thickness of the Si3N4 insulator layer on the photoresponsivity of the MIS photodetector is also discussed. In0.3Ga0.7N metal-insulator-semiconductor (MIS) and metal-semiconductor (MS) surface barrier photodetectors have been fabricated. The In0.3Ga0.7N epilayers were grown on sapphire by metalorganic chemical vapour deposition (MOCVD). The photoresponse and reverse current-voltage characteristics of the In0.3Ga0.7N MIS and MS photodetectors were measured. A best zero bias responsivity of 0.18 A/W at 450 nm is obtained for the In0.3Ga0.7N MIS photodetector with 10 nm Si3N4 insulator layer, which is more than ten times higher than the In0.3Ga0.7N MS photodetector. The reason is attributed to the decrease of the interface states and increase of surface barrier height by the inserted insulator. The influence of the thickness of the Si3N4 insulator layer on the photoresponsivity of the MIS photodetector is also discussed.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2007年第7期2120-2122,共3页 中国物理B(英文版)
基金 Project supported by the State Key Development Program for Basic Research of China (Grant No 2006CB6049), the National Natural Science Foundation of China (Grant No 60476030), and the Natural Science Foundation of Jiangsu Province of China (Grant No BK2006126).Acknowledgment The authors gratefully acknowledge Nanjing Institute of Electronic Devices for fabricating the insulator layers of the photodetectors.
关键词 INGAN PHOTODETECTOR metal-insulator-semiconductor structure InGaN, photodetector, metal-insulator-semiconductor structure
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