摘要
本讲座介绍了激光化学气相沉积的基本原理,较详细地讲述了制备金属薄膜、金刚石薄膜、类金刚石薄膜、氢化非晶硅薄膜、化合物半导体薄膜及绝缘体薄膜等所用的激光器、工艺参数以及薄膜的性能。
The basic principles of laser chemical vapour deposition were introduced. The applied lasers, technological processes and properties of the deposited metal thin films, diamond thin films, diamond-like thin films, hydrogenated amorphous silicon thin films, compound semiconductor thin films and insulating thin films etc. were described in details.
出处
《金属热处理》
CAS
CSCD
北大核心
2007年第8期105-113,共9页
Heat Treatment of Metals
关键词
激光化学气相沉积
激光诱导
激光辅助
光解激光
热解激光
光热共解激光
laser chemical vapour deposition （LCVD）
laser inducement
laser assisted
photolytic laser
pyrolytic laser
photothermallytic laser
