期刊文献+

Optical Absorption Measurements on Nitrogen-doped 6H-SiC Single Crystals 被引量:1

Optical Absorption Measurements on Nitrogen-doped 6H-SiC Single Crystals
下载PDF
导出
摘要 6H-SiC bulk crystals have been prepared by sublimation method in an inductively heated growth reactor. The effect of nitrogen doping on absorption for 6H-SiC was investigated. The absorption measurement based on optical method is a non-destructive and non-contact method. The band-gap narrowing with higher doping concentration was observed. For n-type doping below band-gap absorption band at 623 nm for 6H-SiC was observed. The peak intensity of the absorption band increased with increasing charge carrier concentration obtained from Hall measurements. It is also found that the nitrogen doping level decreased in the radial direction and it was the highest at the beginning of growth. 6H-SiC bulk crystals have been prepared by sublimation method in an inductively heated growth reactor. The effect of nitrogen doping on absorption for 6H-SiC was investigated. The absorption measurement based on optical method is a non-destructive and non-contact method. The band-gap narrowing with higher doping concentration was observed. For n-type doping below band-gap absorption band at 623 nm for 6H-SiC was observed. The peak intensity of the absorption band increased with increasing charge carrier concentration obtained from Hall measurements. It is also found that the nitrogen doping level decreased in the radial direction and it was the highest at the beginning of growth.
出处 《Chinese Journal of Structural Chemistry》 SCIE CAS CSCD 北大核心 2007年第10期1171-1174,共4页 结构化学(英文)
基金 the National Natural Science Foundation of China (No. 50472068) Natural Science Foundation of Shandong Province,(No. Y2006F15) Shandong Provincial Significant Science and Technology Attack Project (No. 2005GG2107001) Shandong Provincial Independent Innovation Significant Science and Technology Special Plan (No. 2006GG1103046)
关键词 6H-SIC SUBSTRATE nitrogen doping absorption measurement 6H-SiC, substrate, nitrogen doping, absorption measurement
  • 相关文献

参考文献9

  • 1Hu, X. B.; Xu, X. G.; Wang, J. Y.; Han, R. J.; Dong, J.; Li, X. X.; Jiang, M. H. J. Chin. Cera. Soci. 2004, 32, 248-254.
  • 2Hofmann, D.; Eckstein, R.; Kolbl, M.; Makarov, Y.; MUller, S. G.; Schmltt, E.; Winnacker, A.; Rupp, R.; Stein, R.; Volkl, J. J. Cryst. Growth 1997, 174, 669-674.
  • 3Wellmann, P. J.; Bushevoy, S.; Welngartner, R. Mate. Scie. & Engi. B 2001, 80, 352-356.
  • 4Weingartner, R.; Wellmann, P. J.; Bickermann, M.; Hofmann, D.; Straubinger, T. L.; Winnacker, A. Appl. Phys. Lett. 2002, 80, 70-72.
  • 5Dubrovskii, G. B.; Lepneva, A. A.; Radovanova, E. I. Phys. Stat. Sol. (b) 1973, 57, 423.
  • 6Bickermann, M.; Epelbaum, B. M.; Hofmann, D.; Straubinger, T. L.; Weingartner, R.; Winnacker, A..L Crystal Growth 2001, 233, 211-218.
  • 7Herro, Z. G.; Epelbaum, B, M.; Weingartner, R.; Bickmann, M.; Masri, p.; Winnacker, A. J. Cryst. Growth 2004, 270, 113-120.
  • 8Anikin, M.; Chourou, P. M.; Bluet, J. M.; Madar, R.; Grosse, P.; Faure, C.; Bassetet G.; Grange Y. C. Mat. Sci. & Eng. B 1999, 61, 73-76.
  • 9Herro, Z. G.; Epelbaum, B. M.; Bickermann, M.; Masri, P.; Winnacker, A..L Cryst. Growth 2004, 262, 105-112.

同被引文献16

  • 1CASADY J B, JOHNSON R W. Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temper- ature applications: a review[J]. Solid-State Electronics, 1996, 39(10) : 1409.
  • 2HENRY A, KORDINA O, HALLIN C, et al. Photoluminescence determination of the nitrogen doping concentra- tion in 6H--SiC [ J ]. Applied Physics Letters, 1994, 65 (19) :2457-2459.
  • 3YAGUCHI H, NARITA K, HIJIKATA Y. Spatial mapping of the carrier concentration and mobility in SiC wafers by micro Fourier transform infrared spectroscopy [ J ]. Materials Science Forum, 2002, 621 ( 3 ) : 89-93.
  • 4NAKASHIMA S, HARIMA H. Spectroscopic analysis of electrical properties in polar semiconductors with over- damped plasmons [ J]. Applied Physics Letters, 2004, 95 ( 7 ) :3541-3546.
  • 5SHAFFER P T B. A review of the structure of silicon carbide [ J ]. Acta Crystallographica, 1969, B25 (3) :477.
  • 6SUNKARI S, MZAAOLA M S, MAZZLOLA J P. Investigation of longitudinal-opfical-phonon plasmon-coupled mode in SiC epitaxial film using Fourier transform infrared reflection[J]. Journal of Electronic Materials, 2005, 34 (4) :320-323.
  • 7NEYRET B, FERRO G, JUILLAGUET S. Optical investigation of residual doping species in 6H-and 4H-SiC layers grown by chemical vapor deposition[J].Materials Science and Engineering, 1999, B61-62:253-258.
  • 8STIASNY T, HELBIG R. Thermoluminescence and related electronic processes of 4H/6H--SiC[J].Physica Status Solidi (a) Applications and Materials Science, 1997, 162 ( 1 ) :239-249.
  • 9LIMPIJUMNONG S, LAMBRECHT W R L, RASHKEEV S N et al. Optical-absorption bands in the 1-3 eV range in n-type SiC polytypes [J]. Physical Review B, 1998, 57 (19) :12017-12022.
  • 10SRIDHARA S G, BAI S, SHIGILTCHOFF O, et al. Absorption bands associated with conduction bands and impurity states in 4H and 6H SiC [J].Materials Science Forum, 2000, 338-342:551-554.

引证文献1

二级引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部