摘要
建立了TiAl合金蒸发和沉积数学模型,采用活度系数体现溶池中不同组元的相互作用,影响组元蒸发速率的因素主要有元素饱和蒸气压和活度系数,计算值与试验值符合良好。研究结果表明,TiAl合金可以采用底部连续进给单一水冷铜坩埚通过电子束物理气相沉积得到。
A mathematical model for the calculation of TiAl alloy evaporation and deposition was developed. The activity coefficients of the elements represent the interaction between the components in the liquid pool. It is found that the main parameters affecting the evaporation rate include the activity coefficients and saturation vapor pressures of the elements. Experimental data are coincided with calculated data well. The results show that TiAl alloy can be deposited using the so-called single-crucible consisting of a water-cooled copper crucible with the base material being fed continuously through the bottom of the crucible.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2007年第10期1759-1762,共4页
Rare Metal Materials and Engineering
基金
总装备部预研基金项目(51418040304HT0114)
关键词
电子束物理气相沉积
TIAL
蒸发
活度系数
饱和蒸气压
electron beam physical vapor deposition
TiAl
evaporation
activity coefficient
saturation vapor pressure
