摘要
近年来,对精加工表面质量的要求日益增高,使得表面粗糙度的测量具有越来越重要的地位.提出了一种新颖的,利用光的干涉原理测量光滑物体表面粗糙度的方法.该光路使用一个半波片改变一路光束的偏振态,避免了以前广泛使用的类似测量系统中光路具有可逆性的问题,保证了系统的稳定性.使用一个1/4波片使接收端的光束的偏振态方向一致,使干涉信号最强.采用两光束共光路、同心聚焦扫描方法可实现表面粗糙度的绝对测量.通过对一标准量块的测量验证了方案的可行性,结果表明该系统在实验室现有条件下可以测量轮廓算术平均偏差Ra为0.012μm的粗糙度量块.
In recent years, the measurement of the surface roughness becomes more and more important with the higher demand of the fining surface. A novel method using interferometric principle to measure the smooth surface roughness is proposed. The polarization state of the beam in one path is changed utilizing a half wave-plate, avoiding the reversibility problem of the previous similarly system widely-used, and the stability of the system is ensured. A quarter-wave plate is used to make the consistency of the polarization states of the received light, making the utmost intensity of the interferometric signal. The absolute measurement values of the surface roughness are achieved using two concentrical beams scanning the surface. The feasibility is verified by the measurement of a sample block. The arithmetic average deviation value of the profile of a gage block of 0.012μm is obtained.
出处
《哈尔滨工程大学学报》
EI
CAS
CSCD
北大核心
2007年第10期1182-1187,共6页
Journal of Harbin Engineering University
