摘要
采用电子束真空镀膜和离子辅助沉积的方法，在口径φ150mm，厚度6mm．且具有较大曲率的多光谱ZnS导流罩上，镀制红外增透保护膜。所镀膜层在3～5μm平均透过率高于90％，在8～10μm平均透过率高于92％，并且能够承受恶劣的环境测试。
The multi-waveband infrared antireflection and protection film, on the ZnS dome which di- amter is 150 mm, the thickness is 6 mm and the radius of curvature is larger, was plated by the method of electronic beam vaccum deposition and ion-beam assisted deposition. The film average trans- missivity is above 90 % in 3-5 μm and 92 % in 8-10 μm, and it can pass the mal-condition tests.
出处
《兵工学报》
EI
CAS
CSCD
北大核心
2007年第10期1183-1185,共3页
Acta Armamentarii
关键词
工程通用技术
红外增透与保护膜
真空镀膜
离子辅助沉积
current technique of engineering
infrared antireflection and protection film
vacuum de-position
ion assistant deposition
