摘要
采用化学气相沉积法(CVD)在多孔活性碳基体上制备掺硼金刚石涂层多孔电极。用扫描电子显微镜(SEM)法表征了金刚石膜的表面微观结构,采用循环伏安法和交流阻抗法研究了电极的电化学性质。结果表明,金刚石表面形态为球形,金刚石膜电极具有很宽的电势窗口,在酸性、中性和碱性3种介质中分别为4.4V、4.0V和3.0V。在铁氰化钾电解液中,金刚石膜电极表面在反应过程中始终保持良好的活性,在表面进行的电化学反应具有良好的准可逆性。
Active carbon pellet as substrates for the deposition of diamond films were prepared by chemical vapor deposition （CVD）. The ballas diamond morphologies of the as-deposition films were analyzed by scanning electron microscopy. Raman spectroscopy was used to investigate the crystal structure. The electrochemical behavior of a boron-doped diamond film electrode prepared on porous ac- tive carbon substrates was studied by cyclic vohammetry and AC Impedance. The diamond films exhibited a ballas morphology and contained mlcrocrystallites. The potential windows in acidic, neutral or alkaline medium were respectively 4.4 V, 4. 0 V and 3.0 V. In the electrolyte including Ferri/Ferrocyanide, the electrode surface kept good activity, and the electrochemical reaction occurring on the surface was a diffusion-controlled reaction, with good quasi-reversibility.
出处
《中山大学学报（自然科学版）》
CAS
CSCD
北大核心
2007年第B06期76-78,共3页
Acta Scientiarum Naturalium Universitatis Sunyatseni
基金
上海市教委重点项目资助项目(06ZZ96)
关键词
多孔碳
金刚石涂层
电化学
Active Carbon Pellet
diamond film elec,trode
electrochemical
