摘要
数字化掩模制作系统的核心控制部件是数字微镜。文中系统分析了数字微镜控制系统对数字化掩模制作系统精度的影响。指出误差来源主要为数字微镜帧刷新率、像素黑栅效应、像素量化和调制非线性等因素,并分别提出了相应的误差修正或补偿方法。提高系统的精缩倍数、像素分辨率以及占空比,可以降低这些误差来源的影响。
Digital micromirror device is the core control one in the digital mask manufacture system. The influence of digital micromirror device on the precision of the digital mask manufacture system is analyzed systematically. That the origins of error are mostly refurbish rate of frame, pixelilation effect, pixel sampling, and non-linear modulation is pointed out. The error correction or compensation way is proposed. It can reduce the influence of these error sources by enhancing system minification, resolving power and fill factor.
出处
《液晶与显示》
CAS
CSCD
北大核心
2007年第5期607-610,共4页
Chinese Journal of Liquid Crystals and Displays
基金
安徽省教育厅自然科学基金项目(No.2006KJ050B)
关键词
数字微镜
衍射光学元件
掩模
误差分析
digital micromirror device
diffractive optical device
mask
error analysis
