摘要
利用四对靶溅射的方法制备了Mo/Al光学多层膜,通过X射线小角度掠射法(LAXD)、断面高分辨透射电镜(HREM)以及透射电镜(TEM)等分析手段,研究了该薄膜在在制备态及不同的退火温度下微结构及其热稳定性.结果表明:在制备态下,Mo和Al都为多晶结构,界面的混合层厚度与生长顺序有关系,不对称.随着退火温度的升高,多层膜呈现出周期延展,伴随峰增加.550℃以下,周期延展和出现了6级布拉格峰分别归结于晶粒的长大和退火增强了层间相关程度;550℃时,出现了Al-Mo非晶合金,有意思的是此时多层膜的界面粗糙度并没有增加,周期膨胀与450℃时候基本一致,仅层厚比发生了变化.而600℃时候,多层膜的周期结构则被完全破坏.
The structure and thermal stability of Mo/Al multilayers prepared by a four facing target sputtering system have been studied. Cross-sectional high-transmission electron microscopy reveals that Mo and Al layers are polycrystalline and that the thickness of the mixed layers at Mo-on-Al interfaces is larger than that at the Al-on-Mo interfaces. Annealing treatment up to 450 ℃ leads to the gradual period expansion and appearance of the 5th and 6th order Bragg peak, which can be attributed to grain growth and sharpness of the interfaces and/or improvement of the correlations of the roughness at different interfaces through annealing respectively. Thermally induced interdiffusion or reaction at grain boundaries with high density restricts the further period expansion in spite of the increasing temperature. At 550 ℃, the modulation structure is still well maintained though the amorphous Al-Mo alloy layer replaces the Al layer. Further annealing to 600℃ would partly destroy the layered modulation structure.
出处
《闽江学院学报》
2007年第5期83-87,共5页
Journal of Minjiang University
