摘要
研磨抛光采用浸液式定偏心锡磨盘抛光方式,研究抛光液浓度、PH值、上下研磨盘转速、抛光时间等参数对微晶玻璃超光滑表面粗糙度的影响,粗糙度的测量采用NT1100干涉仪.实验结果表明:粗糙度受PH值影响比较大;试件在低浓度弱碱抛光液中,延长抛光时间可降低表面粗糙度值并获得高质量的表面,最终测得表面粗糙度为Ra=0.37 nm.
The polishing manner of fixed eccentricity immersed tin lap was used in lapping and polishing. The effect of concentration of polishing fluid, PH value, rotate speed, and polishing time on super smooth surface roughness of ceramic glass was researched. The roughness was measured by NT1100 interferometer. The influence of PH value on roughness is greater than that of other parameters. The roughness is decreased by increasing polishing time under the workpiece in low concentration alkalescent polishing fluid, and high surface quality is secured. Finally, with the reasonable choice of polishing parameter, surface roughness of Ra is 0.37nm.
出处
《郑州大学学报（工学版）》
CAS
2007年第4期126-128,共3页
Journal of Zhengzhou University（Engineering Science）
基金
北京市自然基金资助项目(3052012)
关键词
微晶玻璃
研磨抛光
粗糙度
工艺
ceramic glass
lapping and polishing
technology
