摘要
研究了Ni-W非晶态合金的电沉积方法,讨论了电解液组成、温度及pH值对镀层组成及镀层结构的影响,获得了Ni-W合金镀层结晶——非晶区域图。根据镀层的X射线衍射实验结果,研究了镀层结构及非晶态结构的形成机理。
The method of electrodepositing Nickel-tungsten amorphous alloy is studied. The effects of electrolyte concentration,temperature,pH to film content and structure are investigated. The nickel-tungsten crystal-amorphous district diagram is achieved. The deposit structure and amorphization mechanism is discussed by X-ray diffraction patterns.
出处
《表面技术》
EI
CAS
CSCD
1997年第3期6-9,共4页
Surface Technology
关键词
电沉积
镀层
非晶态结构
钨镍合金
电镀
Electrodepositon Nickel-tungsten Film Amorphous Structure
