摘要
随着等离子显示器(PDP)制作技术的逐渐成熟,光刻技术在PDP的制作中也越来越重要。本文论述了在PDP制作中影响曝光质量的有关因素,从曝光的主要影响因素进行阐述,并结合实例进行了分析论证。
With PDP manufacturing technology is gradual and ripe, Photolithography technology is more and more important in the making of PDP. This article has discussed the fact that influences the relevant factors which are exposed quality while making in PDP, Explain from the main influence factor that is Exposure, Have combined the embodiment and analyzed that proves.
出处
《现代显示》
2008年第3期44-47,共4页
Advanced Display
关键词
曝光量
间隙
照度
曝光时间
母版
exposure quantity
gap
Intensity of illumination
exposure time
photo-mask
