摘要
采用射频磁控溅射的方法在Si衬底上制备了掺Mn的SiC薄膜,用X射线衍射、傅里叶变换红外光谱、扫描电镜及荧光光谱等方法,对薄膜的结构、表面形貌、化学键状态和光学性能进行了研究。结果表明:掺Mn使SiC晶格发生畸变,X射线衍射峰强度下降,Si-C键振动减弱;同时,由于掺Mn后提供了更多的Si空位复合发光中心,SiC薄膜在近带边414 nm处的室温光荧光峰增强为1.3倍。
Mn-doped SiC films were grown by radio frequency magnetron sputtering on silicon substrate. Its mi- crostructures and optical properties were characterized with X-ray diffraction （XRD）, scanning electron microscopy （SEM）, Fourier transform infrared spectmscopy（FTIR） and ultraviolet fluorescence spectroscopy. The results show that Mn doping significantly affects the microstructures, chemical bonding, and optical properties of the SiC films. For exampie, as the Mn dopant concentration increases up to 15%, three features, including the lattice distortion, weakening of the SiC bond,and about 1.3 times intensity increase of photoluminescence emission（414nm）, were clearly observed at room temperature. Possible mechanism could be that Mn dopant produces increased Si vacancies.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2008年第3期240-243,共4页
Chinese Journal of Vacuum Science and Technology
基金
国家863项目(No.2006AA03Z219)
南京航空航天大学引进人才基金(No.S0417061)
关键词
SIC薄膜
磁控溅射
过渡金属Mn
光学性能
SiC film, Magnetron sputtering, Transition metal Mn
Optical properties
