摘要
简要介绍了铟(In)的用途及国内铟产业的现状。重点介绍了国内外ITO(铟锡氧化物)靶材的研究现状、主要制备方法(热等静压法、热压法和烧结法)及发展趋势。
The use of indium and the status of of ITO（indium-tin-oxide）target material and isostatic pressing, hot pressing and sintering, indium industry was reviewed. The research the main producing method, include hot were described .The developing trend of ITO target material was prospected.
出处
《电工材料》
CAS
2008年第2期35-37,42,共4页
Electrical Engineering Materials
基金
973计划前期研究专项(2008CB617609)
