期刊文献+

TiN、Ti(C,N)和(Ti,Al)N涂层的结构和性能研究 被引量:8

Researches on Microstructure and Properties of TiN、Ti(C,N) and(Ti,Al)N Multilayer Coatings
下载PDF
导出
摘要 借助EPMA、XRD、SEM、纳米压痕和划痕仪研究了采用磁控溅射在硬质合金基体上沉积的TiN、Ti(C,N)和(Ti,Al)N涂层的组织结构和力学性能。研究表明,TiN涂层的晶粒形貌为典型的喇叭口结构,呈(220)生长织构;Ti(C,N)与(Ti,Al)N涂层为平直的柱状晶结构,但表现出不同的取向。Ti(C,N)涂层表现出最高的硬度,TiN涂层则表现出与基体更好的结合力,(Ti,Al)N涂层由于其好的高温稳定性表现出最好的切削性能。 The microstructure and mechanical properties of TiN, Ti ( C, N ) and ( Ti, A1) N coatings deposited on ce- mented carbide substrates by magnetron sputtering have been characterized by electron probe microanalysis (EPMA), X -ray diffraction (XRD), scanning electron spectroscopy (SEM) and nano-indenter and scratcher. The results show that the crystal grains of TiN coating have a typical bell-mouthed structure with (220) preferred orientation. Both Ti( C, N) and (Ti, Al) N coatings show straight columnar structures but different preferred orientations. Ti( C, N) coating exhibits the highest hardness. TiN coating presents better adhesion with substrate. (Ti, Al)N coating has the best cutting properties due to its good thermal stability.
出处 《矿冶工程》 CAS CSCD 北大核心 2008年第3期114-116,共3页 Mining and Metallurgical Engineering
关键词 涂层 微观结构 硬度 结合力 切削性能 coating microstructure hardness adhesion cutting property
  • 相关文献

参考文献8

  • 1闻立时,黄荣芳.离子镀硬质膜技术的最新进展和展望[J].真空,2000,37(1):1-11. 被引量:60
  • 2Heau C, Terrat J P. Uhrahard Ti-B-N coatings obtained by reactive magnetron sputtering of a Ti-B target[ J]. Surface and Coatings Technology, 1998, 108- 109:332-339.
  • 3Veprek S, Nesladek P, Niederhofer A, et al. Recent progress in the superhard nanocrystalling composites: towards their industrialization and understanding of the origin the superhardness [ J ]. Surface and Coatings Technology, 1998, 108-109: 138- 147.
  • 4Schneider J M, Sproul W D. Reactive pulsed dc magnetron sputtering and control. Handbook of Thin Film Process Technology, 1998, AS: 1 - 12J. Musil and H. Hruby. Superhard nanocomposite Ti1-xAlxN films prepared by magnetron sputtering[ J]. Thin Solid Films, 2000, 365 : 104 - 109.
  • 5Musil J, Hruby H. Superhard nanocomposite Ti1-xAlxN films prepared by magnetron sputtering [ J ]. Thin Solid Films, 2000, 365 : 104 - 109.
  • 6Lux B, Colombier C, Ahena H, et al. Preparation of alumina coatings by chemical vapour deposition [ J ]. Thin Solid Films, 1986, 138:49-64.
  • 7Svensson H, Angenete J, Stiller K. Microstructure of oxide scales on aluminide diffusion coatings after short time oxidation at 1050°C [ J ]. Surf Coat Technol, 2004, 177 - 175:152 - 157.
  • 8Hornauer U, Richter E, et al. Microstructure and oxidation kinetics of intermetallic TiAl after Si- and Mo-ion implantation[ J]. Surf Coat Technol, 2000, 128 - 129:418 -422.

二级参考文献144

  • 1L.S.Wen,et al.[J].J.Mat Sci andTechnol.93.1984,14:289~293.
  • 2B.A.Movchan,et al.[J].Phys.Met.Metallogr.1969,28:83.
  • 3J.A.Rhornton.[J],Ann.Rev.Mat.Sci.1991,7:239.
  • 4R.Messier,et al.[J].J.Vac.Sci.Technol.1984,A2:500
  • 5L.S.Wen,et al.Proc.of the lst Int.Cont.on Plasma Surface Engineering[C],Sept.1988,19~23.Garmisch-Partenkirchen,ERG,PlasmaSurface Engineering,eds.E.Broszeit,W.D.Munz,H.Oechsher,K.T.Rie,G.K.Woy,DGM InformationsgesellschaftmbH,1989,V2:1041.
  • 6L.Hultman,et al.[J].J.Appl.Phys.1987,2:552.
  • 7T.Tagaki.[J],J.Vac.Sci.Technol.1984,A2:382.
  • 8L.S.Wen et al.[J].Surf Eng,1990,6:1,41.
  • 9Petrov,et al.[J]. Thin Solid Films,1989,169:299.
  • 10D.S.Rikerby et al.[J].Surf.Coat.Tech.,1989,39/40:355.

共引文献59

同被引文献79

引证文献8

二级引证文献28

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部