7Baskett F and Hennessy J I. Science, 1993, 261:864-871.
8Lithography and the Future of Moore' s Law. G. E. Moore in SPIE Proceedings on Electron - Beam,X- ray, EUV and Ion Beam Lithographies for Manufacturing, Vol. 2437, Feb. 1995.
9Hild R. Nitzsche G..Altenburger U. Superresolution Lithography from the Viewpoint of Partially Coherent Image Theroy, Microelectronic Engineering, 1995, 26: 71-92.