摘要
采用射频等离子体化学气相沉积的方法在有机玻璃表面沉积一层氧化硅薄膜,以提高其耐磨性能。分别使用红外光谱、金相显微镜和微型磨损试验机对所沉积的氧化硅薄膜进行了结构和表面性能分析。测试了改性前后试样的摩擦磨损行为。FTIR测试结果表明,所沉积薄膜出现了明显的Si-O-Si吸收峰,说明沉积物为氧化硅结构。磨损试验显示氧化硅涂层可以显著地提高有机玻璃的耐磨性能,但受等离子体放电参数的影响。最后,对参数进行了优化并得到了最佳的沉积工艺。在放电功率为200 W,氧气和单体的比例为3∶1,工作气压40 Pa,沉积时间30 min的条件下,沉积的氧化硅薄膜具有最佳的耐摩擦磨损性能。
The SiOx coatings were grown by RF plasma-enhanced chemical vapor deposition （RF-PECVD） on the polymethylmethacrylate （PMMA） substrates to improve its mechanical properties. The micmstructures and properties were characterized with Fourier transform infrared spectroscopy （FUR）, metallographic microscopy and some conventional mechanical probes. The influence of the coating conditions on silicon oxides growth was studied. The results show that the silicon oxides coating significantly improves the mechanical properties of the PMMA. For instance, the SiOx coating, grown under optimized conditions,i, e, at a RF power of 200 W, a pressure of 40 Pa, an oxidation time of 30 rain, and an oxygen/Hexamethyldisiloxane （HMDSO） ratio of 3：1, on the surface of PMMA has low friction coefficient, high wear resis- tance and surface hardness.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2008年第4期374-378,共5页
Chinese Journal of Vacuum Science and Technology
