摘要
说明了一种能在钛基上直接电镀金属钌的新工艺。该工艺在三氯化钌体系中进行,通过在电镀液中加入氨基磺酸、氯化铵和一些添加剂,提高了钌镀工艺的电流效率,且镀层光亮平整。试验还通过电化学测试、扫描电镜（SEM）和XRD等方法研究了电流密度、温度、pH值、主盐和添加剂浓度等参数对镀层性能的影响。结果表明：电镀钌工艺最佳电流密度范围是0.5-0.8A/dm^2,添加剂浓度的最佳范围是20-30g/L,微观电镜图也显示了钌镀层较为致密。最后,该镀钌工艺实现了在主盐浓度不高的情况下仍然镀出了致密的钌层。
A new technology of ruthenium electrodeposition on titanium plates was developed through a great deal of experiment and efforts. The weak acidic electroplating solution was composed of mainly ruthenium trichloride, a kind of complexing agent, and a small amount of conducting salt. We have investigated the influence of the current density, temperature, pH value, concentration of ruthenium, and the additives on the ruthenium deposition with SEM, XRD, and electrochemistry methods. The optimum range of the current density and the consentration of additive are 0.5-0.8A/dm^2 , 20-30 g/L respectively. The results indicated that the improved technology can produce a compact ruthenium layer even under the condition of low main salt concentration.
出处
《装备环境工程》
CAS
2008年第4期10-13,48,共5页
Equipment Environmental Engineering
关键词
电沉积钌
钛基板
电流效率
ruthenium electrodeposition
titanium plate
current efficiency
