摘要
本文用部分相干光成像理论研究了提高分辨力及增大焦深的原理．建立了二元光栅倾斜照明成像数理模型。对几种倾斜照明方式进行了模拟计算．对模拟结果作了分析比较。结果表明，用二元光栅照明较好，既能较大程度提高投影光刻曝光系统的分辨力及焦深，又能克服其他照明方式的能量利用率低等缺点。
The principle of oblique illumination for improving photolithographic resolution and increasing depth of focus is presented with partially coherent theory. It has been proved that partially coherent imagery is based on coherent imagery. In order to realize oblique illumination, we add a binary grating. The mathematical models of binary grating are set up. The results show that the energy. resolution and DOF increase on the condition of binary grating illumination, compared with other illuminations.
出处
《微细加工技术》
1997年第4期55-62,共8页
Microfabrication Technology
关键词
二元光栅照明
部分相干成像
VLSI
光刻机
Binary grating illumination
Photolithographic resolution
Depth of focus
Partially coherent imagery
