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SUB-NANOMETER POLISHING OF MAGNETIC RIGID DISK HEADS TO AVOID POLE TIP RECESSION 被引量:2

SUB-NANOMETER POLISHING OF MAGNETIC RIGID DISK HEADS TO AVOID POLE TIP RECESSION
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摘要 For the purpose of solving the problem that too large pole tip recession (PTR) is produced in magnetic rigid disk heads by mechanical polishing, a chemical mechanical nano-grinding experiment is performed by using a float-piece polisher with a tin plate to achieve a more plane and smoother surface. A basal solution, addition agents and a range of pH value are suitably selected to find a kind of slurry, with which the PTR can be controlled on sub-nanometer scale and the giant magnetic resistance (GMR) corrosion and electrostatic damage (ESD) can be avoided. Moreover, the cause that TiC protrudes from the substrate surface of the heads is studied. The appropriate shape and size of diamond abrasive are selected according to the chemical activation of A1203 and TiC in the same slurry. In this way, the chemical and mechanical interactions are optimized and the optimal surface that has small PTR and TiC asperity is achieved. Ultimatily, the chemical mechanical nano-grinding in combination with mechanical nano-grinding is adopted. Sub-nanometer PTR is achieved and the TiC asperity is eliminated by the chemical mechanical nano-grinding with large size ofmonocrystalline followed by mechanical nano-grinding with smalle polycrystalline diamonds. For the purpose of solving the problem that too large pole tip recession (PTR) is produced in magnetic rigid disk heads by mechanical polishing, a chemical mechanical nano-grinding experiment is performed by using a float-piece polisher with a tin plate to achieve a more plane and smoother surface. A basal solution, addition agents and a range of pH value are suitably selected to find a kind of slurry, with which the PTR can be controlled on sub-nanometer scale and the giant magnetic resistance (GMR) corrosion and electrostatic damage (ESD) can be avoided. Moreover, the cause that TiC protrudes from the substrate surface of the heads is studied. The appropriate shape and size of diamond abrasive are selected according to the chemical activation of A1203 and TiC in the same slurry. In this way, the chemical and mechanical interactions are optimized and the optimal surface that has small PTR and TiC asperity is achieved. Ultimatily, the chemical mechanical nano-grinding in combination with mechanical nano-grinding is adopted. Sub-nanometer PTR is achieved and the TiC asperity is eliminated by the chemical mechanical nano-grinding with large size ofmonocrystalline followed by mechanical nano-grinding with smalle polycrystalline diamonds.
出处 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2008年第4期7-10,共4页 中国机械工程学报(英文版)
基金 National Natural Science Foundation of China(No. 50390061).
关键词 Polishing Magnetic rigid disk head Pole tip recession (PTR) Chemical mechanical nano-grinding Polishing Magnetic rigid disk head Pole tip recession (PTR) Chemical mechanical nano-grinding
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