摘要
ＺｎＯ薄膜具有强的压电和光电效应，广泛用于制作各种声电和声光器件中．本文报道了用微波ＥＣＲ等离子体溅射法沉积了ＺｎＯ薄膜，并研究了该法制备ＺｎＯ膜的工艺．结果表明，所形成的ＺｎＯ膜的性质强烈地依赖于溅射沉积条件．
Zinc oxide (ZnO)thin films with strong piezoelectric and piezooptic effects have been widely used in acousto-electric and acousto-optic devices.This paper reports on structural properties of ZnO films by microwave ECR plasma sputtering deposition and studies ZnO films processed.The results show that properties of the ZnO films formed in our work strongly rely on the sputter deposition condition.
出处
《武汉化工学院学报》
1997年第2期84-87,共4页
Journal of Wuhan Institute of Chemical Technology
基金
国家自然科学基金
