摘要
在HFCVD系统中制备了直径为100mm的自支撑CVD金刚石厚膜,利用XRD研究了自支撑CVD金刚石厚膜的应力。结果显示制备的大面积自支撑CVD金刚石厚膜处于较低的应力水平,应力分布较均匀,生长面应力状态为压应力,成核面应力状态为张应力。
Diameter of 100 mm large area free-standing diamond thick film was prepared on Mo substrate by hot filament chemical vapor deposition method. The stress in the large area free-standing CVD diamond thick film was studied using X-ray diffraction sin^2ψ method. The results show that the stress in the film tested on the final surface is less than 290 MPa, and the stress on the original surface is less than 200 MPa. The stress in the film on the final surface is comoressive, and stress on the original surface is tensile.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2008年第6期1444-1447,共4页
Journal of Synthetic Crystals
基金
国家自然科学基金资助项目(No:50605032)
江苏省自然基金资助项目(No:BK2006189
BK2007193)
江苏省精密与微细制造技术重点实验室资助项目(No:JSPM200705)
