摘要
以镀层表面光亮度和结合度为目标函数,采用正交实验法分别考察了NiCI2.6H2O、NaH2PO2.H2O、KBH4、H2NCH2CH2NH2、3CdSO4.8H2O和温度对石英光纤表面化学镀Ni-P-B的影响,并确定了它们的优化条件分别为:24 g.L-1,10 g.L-1,1.0 g.L-1,24 mL.L-1,0.6 mg.L-1和90℃。采用单因素实验法研究了上述各工艺参数对Ni-P-B沉积速度的影响,在此基础上,建立了Ni-P-B沉积速度的动力学方程。经实验验证,该模型与实验结果吻合度较好,对石英光纤表面化学镀Ni-P-B沉积过程的调节和产物的控制具有一定的参考价值。
Orthogonal experimental method was used to investigate the effects of NiCl2 · 6H2O,NaH2PO2 · H2O, KBH4 、 H2NCH2CH2NH2 ,3CdSO4 · 8H2O and temperature on Ni -P- B electroless plating on quartz optical fiber surface when the lightness and combination extent of Ni - P - B thin film were taken as the objective functions. The optimal values of the six factors above were determined as ：24 g · L^-1, 10 g · L ^-1, 1.0 g · L^-1, 24 mL · L^- 1 ,0.6 mg · L^- 1 and 90 ℃, respectively. Single experimental method was applied to study the effect of the six factors on Ni - P - B deposition rate based on which the kinetic models for Ni - P - B deposition were established. The models were proven to be in a good accordance with the experimental results , which has certain reference value for the process adjusting and product controlling of the Ni -P- B deposition.
出处
《南昌大学学报（理科版）》
CAS
北大核心
2008年第5期452-456,共5页
Journal of Nanchang University(Natural Science)
基金
国家"973"资助项目(GrantNo.2005cca04300)
关键词
化学镀
石英光纤
Ni—P—B
动力学
electroless plating
quartz optical fiber
Ni - P - B
kinetics
