摘要
采用离子束溅射方法在单晶Si(100)基片上沉积厚度为100nm的Al2O3薄膜,利用原子力显微镜、X射线光电子能谱、掠入射衍射等微观分析手段,研究了薄膜的表面形貌、粗糙度、成分,及退火后微观结构的变化。研究表明:室温沉积在基片上的纳米薄膜为非晶态,纳米颗粒为无方向性沉积,颗粒呈团球状,其成分基本满足Al2O3的标准成分配比。850℃×6h退火处理后,生成晶态的-γAl2O3,薄膜表面结晶完整,颗粒清晰可见。
Al_2O_3 nano-films with thickness of 100nm were successfully deposited on monocrystalline silicon surface.Atomic force microscope and X-ray photoelectron spectroscopy and X-ray diffraction were employed to characterize surface morphology,roughness,component and microstructure of the Al_2O_3 nano-films after annealing.The results indicate that the amorphous Al_2O_3 nano-films with stuichiornetric composition and microspheric structure formed due to random deposition of nano-particles are obtained by ion beam sputtering deposition at temperature below 100℃.After annealing at 850℃ for 6h,the amorphous Al_2O_3 nano-films transforms to γ-Al_2O_3,crystalline films.
出处
《材料热处理学报》
EI
CAS
CSCD
北大核心
2009年第1期166-169,共4页
Transactions of Materials and Heat Treatment
关键词
纳米薄膜
离子束沉积
掠入射衍射
退火
nano-films
ion beam sputtering deposition
grazing incident diffraction
annealing
