摘要
采用多弧离子镀在聚酰亚胺(PI)基底上制备了TiO2/TiN低红外发射率迷彩薄膜,通过控制溅射的时间,使制备出的薄膜在可见波段具有各种丰富的颜色效果,使其具有迷彩特性,通过制备工艺的优化使其在8μm^14μm波段具有较低的红外发射率。采用扫描电镜、红外辐射率测量仪、紫外-可见-近红外光光度计等测试手段对薄膜样品进行了表征。实验结果表明,采用多弧离子镀成功的在PI基底上制备了具有多种颜色的发射率最低0.27的低红外发射率薄膜。
The TiO2/TiN camouflage thin films with Low infrared emission were grown by multi-arc plasma deposition on flexible polymide （PI）.The microstructures and properties of the TiO2/TiN camouflage thin films were characterized with scanning electron microscopy （SEM）, infrared emission spectroscopy and ultraviolet visible spectroscopy （UVVis）. The sputtering time significantly affects the colors of the films in the visible band with good camouflage characteristics. The results show that high quality multi-colored films with low infrared emission can be grown by multi-arc plasma deposition on PI substrate and that the interfacial adhesion is rather strong.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2009年第2期213-217,共5页
Chinese Journal of Vacuum Science and Technology
关键词
多弧溅射
低发射率
迷彩
多层薄膜
Multi-Arc sputtering, low emissivity, Comouflage, Multilayer thin films
