摘要
在VLSI制造过程中,静电吸盘(ESC)以其良好的热传导性及较少的缺陷产生率已广泛应用于ETCH、CVD等制程中。文章以LAM Research公司TCP9400等离子刻蚀机在多晶硅刻蚀的生产实践为例,分析了这种双极性静电吸盘(bipolar-ESC)的结构特点和其工作原理,并逐一分析了在其使用过程中各参数补偿电压、夹持电压、冷却气体等对产品良率的影响,并提出了对生产过程的监控参数,以达到及时发现问题、解决问题的目的。
In the modern VLSI manufacturing, ESC have been widely used in ETCH, CVD process for its good heat transfer, uniformity control, and low defect production. ESC plays a very important rule in the process chamber system. Based on LAM TCP9400 etcher on polysilicon mass production, this paper analyses that how the bipolar-ESC influences the production under different parameter settings, and how to monitor the problems of the ESC system.
出处
《电子与封装》
2009年第3期32-35,共4页
Electronics & Packaging
