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Deposition of tungsten-titanium carbides on surface of diamond by reactive PVD 被引量:5

Deposition of tungsten-titanium carbides on surface of diamond by reactive PVD
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摘要 The coatings of W-Ti carbides on the surface of diamond was obtained by using physical vapor deposition (PVD), during which WO3 powders pre-treated with hydrofluoric acid were reduced by titanium hydride in vacuum at 850 ℃. The resistance of diamond to corrosion at high-temperature was investigated. The formation of W-Ti carbides on the surface of diamond was verified by X-ray diffraction analysis, the interface state between diamond and matrix in metaLbase diamond composite was observed by scanning electron microscope. The results showed that the carbide coating is easy to be formed at low deposition temperature on the surface of diamond, while the resistance of diamond to corrosion at highutemperature and the strength of bonding between diarnond and metal matrix are effectively improved. The coatings of W-Ti carbides on the surface of diamond was obtained by using physical vapor deposition (PVD), during which WO3 powders pre-treated with hydrofluoric acid were reduced by titanium hydride in vacuum at 850 degrees C. The resistance of diamond to corrosion at high-temperature was investigated. The formation of W-Ti carbides on the surface of diamond was verified by X-ray diffraction analysis, the interface state between diamond and matrix in metal-base diamond composite was observed by scanning electron microscope. The results showed that the carbide coating is easy to be formed at low deposition temperature on the surface of diamond, while the resistance of diamond to corrosion at high-temperature and the strength of bonding between diamond and metal matrix are effectively improved.
出处 《中国有色金属学会会刊:英文版》 EI CSCD 1999年第4期838-841,共4页 Transactions of Nonferrous Metals Society of China
关键词 DIAMOND PHYSICAL vapor DEPOSITION (PVD) TUNGSTEN carbides TUNGSTEN diamond physical vapor deposition (PVD) tungsten carbides tungsten
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