摘要
采用CS-400型射频磁控溅射仪在Si（111）和石英基底上成功的制备了ZnO薄膜，分别用XRD、SEM、紫外-可见光分光光度计和荧光分光光度计表征样品的结构和光学性质。实验表明，采用射频磁控溅射制备的ZnO薄膜具有六角纤锌矿结构的（002）峰和（101）峰的两种取向。在沉积气压〉1．0Pa时所制备的ZnO薄膜具有（002）择优取向，并且十分稳定。SEM图表明，ZnO薄膜颗粒大小较为均匀，晶粒尺寸随着气压升高而变小，沉积气压不同时，薄膜样品的生长方式有所差异。在400～1000nm范围内，可以看出除0．5Pa下制备的ZnO薄膜外，其余ZnO薄膜在可见光区域的平均透过率超过80％，吸收边在380nm附近，所对应的光学带隙约为3．23～3．27eV，并随着沉积气压上升而变大。ZnO薄膜的PL谱上观察到了392nm的近紫外峰和419nm的蓝峰；沉积气压对ZnO薄膜的发光峰位和峰强有影响。
ZnO films were prepared by the radio frequency magnetron sputtering technique（RF） on Si（111） and quartz glass substrates. The effect of differewn deposition pressure on the structural and optical properties of ZnO films were discussed in details. X-ray diffraction（XRD） pattern indicates that the films are single phase and had wurtzite structure with c-axis orientation. The SEM shows that the grain size of ZnO films increases with the increasing of deposition pressure and then decreases. The growth patterns of ZnO thin films with different deposition pressure are different. In the transmittance spectra of the ZnO films the width of optical energy band gap increased with the increase of deposition pressure. There is no much differents between Transparency spectra and PL spectra of ZnO thin films with different deposition pressure.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2009年第4期560-563,共4页
Journal of Functional Materials
基金
国家自然科学基金资助项目(10275047
10575073)
江苏省高校自然科学基金资助项目(03KJB140116)
关键词
射频磁控溅射
ZNO薄膜
透射率
光学带隙
PL谱
radio frequency magnetron sputtering（RF）
ZnO thin films
deposition pressure transmission
optical energy band gap
PL spectra
