摘要
采用多弧离子镀设备，在高速钢W18Cr4V上先进行等离子氮化，再沉积TiN薄膜，研究了不同渗氮温度和时间对PN＋TiN薄膜组织和性能的影响。结果表明，温度为500℃左右和时间为2h以上条件下对W18Cr4V进行渗氮处理后再沉积TiN薄膜，可以得到最佳的薄膜表面显微硬度（1800～2000HV0.05）和膜／基结合力（50N），涂层耐磨性也得到明显提高。
TiN thin films were deposited after plasma nitriding by multi-arc ion plating system on high speed steel W18Cr4V. The effect of different nitriding temperatures and times on the preparation and properties of PN ＋ TiN films were studied. The results show that the optimal surface microhardness （1 800-2 000 HV005） and adhesion strength （50 N） can be gained when the film is deposited after plasma nitriding at 500 ℃ for over two hours, and the wear resistance of the coating is enhanced remarkably.
出处
《武汉科技大学学报》
CAS
2009年第2期137-141,共5页
Journal of Wuhan University of Science and Technology
