摘要
采用磁控溅射制备TbDyFe非晶薄膜,系统研究了不同温度和时间真空热处理对薄膜结构与磁学性能的影响。当热处理温度高于450℃时,薄膜中有磁致伸缩的RFe2结晶相形成。热处理使Tb0.28Dy0.72Fe2薄膜的易磁化方向从垂直于膜面向平行于膜面转变,并显著提高膜面内饱和磁化强度。450℃真空热处理60min后Tb0.29Dy0.71Fe1.8薄膜饱和磁化强度较高、矫顽力低,更容易在低场下磁化,适于低场下作为磁致伸缩薄膜应用。
The amorphous TbDyFe films were grown on Si（100） substrate by magnetron sputtering. The microstructures of the ThDyFe films were characterized with X-ray diffraction （XRD）. The influence of the vacuum annealing conditions, such as the annealing temperature and annealing time, on the microstructures and magnetic properties was studied. The results show that the annealing conditions considerably affect its magnetic properties. For instance, annealing turns the easy magnetization direction of the Tb0.28Dy0.72Fe2 films from the perpendicular direction to the parallel direction of the film plane and significantly increases its in-plane saturation magnetization. Annealing above 450℃ results in the formation of Laves RFe2 phase. The Tb0.29Dy0.71Fe1.8 film annealed at 450℃ for 60 minutes shows favorable properties, such as high in-plane saturation magnetization, small coercivity and large magnetostriction at low magnetic field.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2009年第3期241-246,共6页
Chinese Journal of Vacuum Science and Technology
基金
教育部高校博士点基金(No.2007073022)
兰州大学交叉学科青年创新基金(No.LZU200503)资助项目
关键词
TbDyFe薄膜
真空热处理
磁性
结构
TbDyFe films, Vacuum annealing, Magnetic properties, Structure
