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“自下而上”法修补含缺陷的钯膜 被引量:1

Repair of defects in Pd composite membranes by bottom-up electroless filling
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摘要 通过在化学镀镀液中添加长链巯基有机物(2-巯基苯并噻唑),利用巯基与金属钯强烈吸附的性质,使其吸附在钯膜表面,这样钯的自催化沉积仅仅发生在缺陷内部而不发生在钯膜表面,从而对含有缺陷的钯膜进行修补.对于选择性分别为720和4的M1和M2两根复合钯膜管,经过多次修补后,选择性S分别提高到2 556和3 990.经过SEM(EDS)和XRD的分析,修补过后的钯膜表面未见硫化物、碳化物等杂质的存在和表面缺陷的存在.结果表明这种自下而上修补法是可行的. The Pd composite membranes containing defects were repaired by electroless plating with addition of 2- mercaptobenzothiazole (MBT). MBT could inhibit the electroless Pd plating on the Pd membrane surface, not in the small defect hole. The ideal H2/N2 selectivity of M1, S, increased from 720 to 2 556 and that of M2 increased from 4 to 3 990 after repairing by this method. The surface of M2 was characterized by SEM (EDS) and XRD. There was no sulfide, carbide and defect on the surface after repairing.
出处 《膜科学与技术》 CAS CSCD 北大核心 2009年第3期48-51,共4页 Membrane Science and Technology
关键词 复合钯膜 自催化沉积 氢气分离 自下而上修补法 Pd composite membrane electroless plating hydrogen separation bottom up fill
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