摘要
利用直流磁控反应溅射技术制备了Ｔａ－Ｎ薄膜。利用ＴＥＭ、ＸＲＤ研究了薄膜显微组织及结构。研究表明，薄膜晶粒细小，可达到１０ｎｍ；在一定工艺条件下制备的Ｔａ－Ｎ薄膜为多相共存结构；磁控反应溅射制备Ｔａ－Ｎ薄膜，沉积压力对薄膜晶粒的显微畸变影响较大，沉积压力降低，晶粒显微畸变增加，导致薄膜中产生较大的微观应力。
The Ta N film is deposited by the DC reactive magnetron sputtering.The microstructures of the film are characterized with XRD and TEM.The results reveal that the grain of the film is very fine,the size of which is as small as 10 nm,multiphases are coexistentin in the film,and microdistortions increase with an decrease in sputtering pressure.
出处
《西南交通大学学报》
EI
CSCD
北大核心
1998年第3期263-268,共6页
Journal of Southwest Jiaotong University
基金
国家自然科学基金
