摘要
采用电化学循环伏安法、线性电位扫描法研究了锰在铅电极上的欠电位沉积(UPD)。结果表明,用铅电极做研究电极时,当MnCl2的浓度为0.02mol/L,NH4Cl的浓度为0.1mol/L,pH=4.9,起扫电位为-1.2V,终止电位为-1.6V,扫描速度为50mv/s时,可以观察到明显的锰欠电位沉积现象;氯离子在锰的欠电位沉积过程中起着重要的作用。
The underpotential deposition of Manganese on surface of lead was studied by electrochemical method. The results show that with lead electrode as a research electrode, phenomenon of the underpotential deposition of Mn is obvious, on the condition of MnCl2 = 0.02 mol / L, NH4Cl = 0.1 mol / L , pH = 4.9, the beginning potential being-1.2V, the final potential being -1.6 V, and the scanning speed being 50 mv/s. Cl^- played a very important role in the process of the underpotential deposition of Mn.
出处
《四川理工学院学报（自然科学版）》
CAS
2009年第3期47-49,共3页
Journal of Sichuan University of Science & Engineering(Natural Science Edition)
基金
材料腐蚀与防护四川省高校重点实验室项目(2008CL12)
关键词
锰
欠电位沉积
铅电极
Manganese
underpotential deposition
lead electrode
