摘要
采用射频磁控溅射法在Si（100）基片上制备了NiZn铁氧体薄膜，研究了退火温度对薄膜性能的影响。采用XRD分析仪分析了薄膜的相结构，原予力显微镜分析了薄膜的表面形貌，振动样品磁强计测量了薄膜的磁性能，结果表明，随着退火温度的升高，薄膜的结晶状态越好，晶粒尺寸越大，饱和磁感应强度越高，面内矫顽力越小。
NiZn ferrite thin films are prepared on single-crystal Si（100） substrate by radio frequency（RF） magnetron sputtering technique, The structure and magnetic properties of the deposited films is investigated as a function of annealing temperature. The crystal structure of deposited films was investigated by the X-ray diffraction（XRD） with Cu K（ radiation,and the surface morphologies（RMS） of deposited films is analyzed by atom force microscopy（AFM）, and the magnetic properties in the plane of deposited films are measured at room temperature using the vibrating sample magnetometer（VSM） as well. Results show that with the increase of annealing temperature, the state of crystallization is better, the grain size is larger,saturation magnetization is higher and coercivity in plane is lower.
关键词
射频磁控溅射
NiZn铁氧体薄膜
退火温度
RF magnetron sputtering technique, NiZn ferrite thin films,annealing temperature
