摘要
用一种新的化学溶液沉积方法在双轴织构NiW(200)合金基底上制备了涂层导体用稀土氧化物RE2O3(RE=Y,Sm,Eu,Dy,Yb)缓冲层。分别利用X射线衍射,扫描电子显微镜,原子力显微镜对制得的RE2O3缓冲层的相结构、织构、表面形貌和平整度进行了检测。结果表明,RE2O3缓冲层具有较好的双轴织构,表面平整无裂纹。
A novel chemical solution deposition approach was employed for the preparation of coated-conductor-used RE203 （RE=Y, Sm, Eu, Dy, Yb） buffer layers on the biaxial NiW（200） alloy substrate. X-ray diffraction （XRD）, scanning electron microscope （SEM）, and atomic force microscope （AFM） were used to characterize the phase structure, texture, surface morphology and roughness of the as-received RE2O3 buffer layers. Results show that the obtained RE2O3 buffer layers have well biaxial texture and their surface is smooth and crack free.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2009年第8期1458-1461,共4页
Rare Metal Materials and Engineering
基金
国家自然科学基金(50672078)
国家杰出青年基金(50588201)
国家973前期项目(2007CB616906)
西南交通大学青年教师科研起步基金(2007Q018)
