摘要
以高纯石墨作靶、氩气(Ar)和三氟甲烷(CHF3)为源气体,用反应磁控溅射法在不同射频功率下制备了氟化类金刚石碳(F-DLC)膜,并对其疏水性进行研究.双蒸水液滴与膜表面接触角的测试结果表明,所制备薄膜表面的最大水接触角可达115°左右.通过原子力显微镜获得的薄膜表面AFM图谱、拉曼光谱以及傅里叶变换红外光谱探讨了影响薄膜的疏水性的因素.结果表明,薄膜的疏水性与薄膜的表面粗糙度和表面键结构直接相关,表面粗糙度越大,疏水性越好,但与薄膜中的F含量和sp3/sp2的比值并未呈单调增加或减小的对应关系.射频输入功率影响着薄膜的沉积速率,与薄膜表面粗糙度、薄膜中芳香环单核的比例以及薄膜表面的键结构(F的接入方式)直接相关.
The fluorinated diamond-like carbon （F-DLC） films were prepared by reactive magnetron sputtering under different radiofrequency power with trifluoromethane （ CHF3 ） and argon （Ar） as source gases and pure graphite as a target. The hydrophobic nature of F-DLC films was studied. The result of measuring contact angle between double-stilled water and film surface shows that the maximal contact angle of film surface is approximately 115°. Factors influencing the hydrophobic nature of films were discussed by film surface morphology measured by atomic force microscopy （AFM）, Raman spectra as well as FTIR spectra. The result demonstrates that the hydrophobic nature of films lies on roughness and bonding configuration of film surfaces. The more the roughness, the stroncer the bydrophobic nature is, but it doesn＇t show a simple decrease or increase with the content of F in films and the ratio of sp^3/sp^2 . Radio-frequency power influences the deposition rate, which correlates with the roughness of the film, proportion of mononuclear aromatics and bonding configuration of films surface （ways of F combination）.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2009年第9期6430-6435,共6页
Acta Physica Sinica
关键词
疏水性
反应磁控溅射
氟化类金刚石膜
射频功率
hydrophobic nature
reactive magnetron sputtering
F-DLC films
radio-frequency power
